The Simulation Research of Total-Reflection X-Ray Fluorescence Analysis Technology Applied in Measurement of Galvanized Sheet Layer

Chinese Journal of Light Scattering ›› 2017, Vol. 29 ›› Issue (3) : 285. DOI: 10.13883/j.issn1004-5929.201703017

The Simulation Research of Total-Reflection X-Ray Fluorescence Analysis Technology Applied in Measurement of Galvanized Sheet Layer

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +
History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2017, 29(3): 285 https://doi.org/10.13883/j.issn1004-5929.201703017

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}

Accesses

Citation

Detail
Sections
Recommended
Copyright © Chinese Journal of Light Scattering
Tel: 86-028-85418067　
Fax: 86-028-85418067　
E-mail: cjls@scu.edu.cn （备用：cjls@qq.com）
Powered by Beijing Magtech Co. Ltd.

/

〈 〉