The Simulation Research of Total-Reflection X-Ray Fluorescence Analysis Technology Applied in Measurement of Galvanized Sheet Layer

Chinese Journal of Light Scattering ›› 2017, Vol. 29 ›› Issue (3) : 285. DOI: 10.13883/j.issn1004-5929.201703017

The Simulation Research of Total-Reflection X-Ray Fluorescence Analysis Technology Applied in Measurement of Galvanized Sheet Layer

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Abstract

This paper analyzes the traditional X-ray fluorescence method to measure the zinc layer thickness of galvanized sheets layer. It proposes a measuring method of galvanized zinc layer based on total reflection X-ray fluorescence analysis technology, and the X-ray total reflection model is set up for simulation in the MCNP. When the X-ray total reflection occurs, zinc layer will almost make the X-ray source reflect completely, associated with a small amount of X-ray fluorescence producing in the normal direction of the galvanized sheet. Using this X-ray fluorescence to analyze directly can effectively reduce the scattering background of source X-ray, improve the accuracy of measurement and reduce the required source X-ray energy. The Simulation results demonstrate that the feasibility of the X-ray total reflection on galvanized sheet, it provides the theoretical basis for practical application.

Key words

X-ray fluorescence analysis ;total reflection X-ray fluorescence analysis / MCNP simulation ;measurement of coating thickness

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. The Simulation Research of Total-Reflection X-Ray Fluorescence Analysis Technology Applied in Measurement of Galvanized Sheet Layer. Chinese Journal of Light Scattering. 2017, 29(3): 285 https://doi.org/10.13883/j.issn1004-5929.201703017

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