Based on the advantages of short X-ray laser pulse, excellence monochromaticity, high energy and superior coherence, X-ray laser interferometry is proposed to measure crystal structures and defects in this paper. As the X-ray laser apparatus wavelength of the order of 10^-10 m, high-precision measurement can be realized. In addition, X-ray laser measurement of crystal devices system, defective crystal measurement model and crystal parameter measurement model are provided in this paper.