Research on the High-Quality Three Wavelength Anti-Reflective Dielectric Thin Film

Chinese Journal of Light Scattering ›› 2018, Vol. 30 ›› Issue (3) : 271. DOI: 10.13883/j.issn1004-5929.201803012

Research on the High-Quality Three Wavelength Anti-Reflective Dielectric Thin Film

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Abstract

The disadvantages of traditional single-wavelength anti-reflective(AR) coating design are analyzed. Based on the reflectivity index data of coating material in the ultraviolet, visible and near-infrared regions, the proper multilayer coating design is obtained. By manufacturing the offset shutter and by optimizing the process parameters in ion-assisted deposition, the optimized technology of three wavelength anti-reflective coating is found and the three wavelength anti-reflective coating spectral shift caused by temperature is small after one month in air. The reflective index in 1053 nm and 527 nm is below 0.5%.and the reflective index in 351 nm is below 0.2%.

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thin film / three wavelength anti-reflective / coating design / ion-assisted deposition

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. Research on the High-Quality Three Wavelength Anti-Reflective Dielectric Thin Film. Chinese Journal of Light Scattering. 2018, 30(3): 271 https://doi.org/10.13883/j.issn1004-5929.201803012

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