Raman spectroscopic evidence of an electron topological transition in osmium at high pressure

LIU Jingyi , ZHANG Leilei , WU Binbin , TAO Yu , FAN Chunmei , Lei Li

PDF(1448 KB)
Chinese Journal of Light Scattering ›› 2023, Vol. 35 ›› Issue (1) : 1-7. DOI: 10.13883/j.issn1004-5929.202301001

Raman spectroscopic evidence of an electron topological transition in osmium at high pressure

Author information +
History +

Abstract

The electronic topological transition (ETT) of the 5d transition metal element osmium (Os) at high pressure has been controversial. So far, there are no other experimental reports that can support the presence of high-pressure ETT in Os, except for some X-ray diffraction data based on high-pressure synchrotron radiation. In this paper, we study the lattice dynamics behavior of metal Os under high pressure in the pressure range of 0~220 GPa, based on the comparative spectroscopy principle. The analysis showed that the pressure coefficient(/dP)of E2g Raman mode in Os was mutated at ~ 110 GPa, and the mode-Grüneisen parameter (γi) produced a corresponding sudden drop. The position of the mutations in the depressed Raman phonon and mode-Grüneisen parameters is close to the anomalous point of the high-pressure synchrotron radiation diffraction experiment, which is most likely related to the Os undergoing ETT at high pressure. The anomalies of the Raman phonon and mode-Grüneisen parameters under high pressure reveals the possible ETT of Os at high pressure. Here we discuss the ETT properties of Os from the perspective of lattice dynamics, providing evidence of Raman spectroscopy for the pressure-induced ETT in Os.

Key words

Osmium / High-pressure Raman scattering / High-pressure comparative spectroscopy / Electronic topological transition

Cite this article

Download Citations
LIU Jingyi , ZHANG Leilei , WU Binbin , TAO Yu , FAN Chunmei , Lei Li. Raman spectroscopic evidence of an electron topological transition in osmium at high pressure. Chinese Journal of Light Scattering. 2023, 35(1): 1-7 https://doi.org/10.13883/j.issn1004-5929.202301001

References

PDF(1448 KB)

332

Accesses

0

Citation

Detail

Sections
Recommended

/